The main task of the R&D Institute is to integrate the core technology of the existing process and strive to improve the product quality and service,develops innovative knowledge and forward thinking in technology and market, thus it creates a corporate vision of sustainable management. The main research and development area is based on semiconductor materials, gradually establishing the core technology of big silicon wafers in China, and further develops the advanced third generation semiconductors.

The R&D institute is mainly responsible for the research and development of core processes such as crystal growth, perfect crystal, thermal field design and simulation, as well as product quality improvement and detection technology research, etc. In addition, we are currently doing the research of the long crystal process of the latest third generation of semiconductors. This project is being carried out mainly by a big team of experienced and senior technology expertise members. Today, the R&D Institute has more than 80 master's and doctoral level of researcher talents, including 20 USA-based researchers located at our USA Office .Our corporation has inked collaboration with Tsinghua University, China University of Mining and Technology ,and other well-known universities in order to nurture more local talents.

The R&D institute has planned to build advanced testing labs for crystal growing, line cutting, polishing, cleaning and epitaxy, supported by a team of simulation professional. With the most advanced researched equipment and best working environment, we will cultivate a strong R&D based manufacturing technologies.